The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 1999
Filed:
Mar. 12, 1998
Applicant:
Inventors:
Tae-yeol Heo, Kyungki-do, KR;
Jung-min Park, Seoul, KR;
Sung-hoon Cho, Seoul, KR;
Gi-jung Kim, Kyungki-do, KR;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C11D / ; C11D / ; C11D / ;
U.S. Cl.
CPC ...
510175 ; 510181 ; 510186 ; 510202 ; 510236 ; 510241 ; 510242 ; 510245 ; 510252 ; 510254 ; 510268 ; 510272 ; 510460 ; 134-12 ;
Abstract
Compositions useful for polishing wafers to be used in microelectronic devices comprise silicon dioxide, aluminum oxide, sodium hydroxide, and water. Cleaning compositions for removing electron wax from wafers to be used in microelectronic devices comprise from about 2 to about 6 percent by weight of ammonium hydroxide, from about 10 to about 22 percent by weight of hydrogen peroxide, and water.