The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 1999
Filed:
Dec. 19, 1996
Rajinder Dhindsa, Milpitas, CA (US);
Steven Franchuk, Fremont, CA (US);
Carlos Manzanilla, San Jose, CA (US);
Ken E Tokunaga, Fremont, CA (US);
LAM Research Corporation, Fremont, CA (US);
Abstract
A substrate lifting arrangement for use in a plasma processing chamber. The plasma processing chamber has a chuck configured for supporting a substrate during processing of the substrate within the plasma processing chamber. The substrate lilting arrangement includes at least one substrate engaging element movable between a first position in which the substrate engaging element does not engage the substrate and a second position in which the substrate engaging element engages the substrate and lifts the substrate off the chuck. The substrate lifting arrangement further includes an actuator coupled to the substrate engaging element. The actuator controls movement of the substrate engaging element between the first and second positions. There is firer included a resistance arrangement coupled to the substrate engaging element. The resistance arrangement limits a current flowing from the substrate to ground through the resistance arrangement. The current is caused by remaining electrical charges on the substrate when the substrate is lifted off the chuck by the substrate engaging element.