The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 1999
Filed:
Aug. 15, 1996
Christophe Pierrat, Boise, ID (US);
Chin Aik Le, Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
A binary mask layout design arranged hierarchically to include a plurality of levels is modified to include optical proximity effect corrections or phase shifting layers. This is accomplished by beginning at the lowest level of the hierarchy and modifying elements or cells in the design. Any modifications that are uniform to corresponding cells throughout the level are placed in the same level in the hierarchy. Any modifications that apply only to selected cells in the level are placed in a higher level in the hierarchy. The process is repeated for all levels in the hierarchy.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile