The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 1999
Filed:
Jul. 12, 1996
Kyoon-hee Goh, Incheon, KR;
Chul-hui Kim, Incheon, KR;
Byung-kwan Lee, Incheon, KR;
Seung-ug Kim, Kyungki-do, KR;
In-hyub Park, Yongin, KR;
Young-chul Jeong, Koyang, KR;
Woung-kwan An, Yongin, KR;
Dong-ho Kim, Yongin, KR;
Hun Cha, Suwon, KR;
Choung-hyep Kim, Seoul, KR;
Guk-hyeong Cho, Yongin, KR;
Samsung Electronics Co., Ltd., Suwon, KR;
Abstract
A UV irradiation apparatus, which includes a UV lamp installed in a chamber for generating UV rays; a vacuum chuck installed below the UV lamp for supporting and moving a wafer; and, a reflector surrounding the UV lamp for concentrating UV rays on the vacuum chuck. The apparatus further includes heating blocks for controlling the temperature at both sides of the vacuum chuck. Thus, it is possible to maintain an essentially constant temperature around the wafer supported by the vacuum chuck. As a result of the temperature control, when a protection tape attached to the front side of the wafer is irradiated with UV rays, an adhesive of the protective tape can be effectively degraded by a chemically reaction under optimum conditions, to thereby easily detach the protection tape from the wafer.