The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 1999
Filed:
May. 01, 1997
Wataru Okase, Sagamihara, JP;
Tokyo Electron Limited, Tokyo-to, JP;
Tokyo Electron Tohoku Limited, Tokyo-to, JP;
Abstract
A heat insulating member is disposed, enclosing a reaction tube, and a heat source is provided through a heat linearing member disposed above the reaction tube and between the reaction tube and the heat insulating member. The reaction tube is made of quartz and has a transparent portion formed in the top thereof and its neighboring thereof, and an opaque portion in the rest part of the reaction tube. In a heat treatment, when heat rays are radiated from the heat source through the heat linearing member, the heat rays pass through the transparent portion of the reaction tube to heat a wafer, but those of the heat rays reflected on the heat insulating member are blocked by the opaque portion of the reaction tube. A heat ray quantity to be passed into the reaction tube can be controlled, whereby high intra-surface temperature uniformity of the wafer can be secured, and as a result high processing yields can be obtained.