The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 1999
Filed:
Nov. 14, 1994
Yoshiaki Sato, Tokuyama, JP;
Mitsuru Katamoto, Kudamatsu, JP;
Hironobu Kawahara, Kudamatsu, JP;
Minoru Soraoka, Yamaguchi-Ken, JP;
Tsuyoshi Umemoto, Hikari, JP;
Hideki Kihara, Kudamatsu, JP;
Katsuyoshi Kudo, Kudamatsu, JP;
Tooru Yukimasa, Kudamatsu, JP;
Hirofumi Kakutani, Kudamatsu, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
The present invention relates to a microwave plasma processing apparatus, suited for generating a plasma by using microwaves, and a processing method. Microwaves propagated through a circular waveguide are tuned in the space thereof by a microwave tuner that is installed to match the impedance, and are introduced in a uniform and most efficient state into a discharge block having a plasma-resistant inner surface that is enlarged in a tapered form through a microwave introduction window. Then, a processing gas controlled to a predetermined pressure by a gas supplying structure and gas evacuating structure is turned into a plasma which is more uniform and is more dense by interaction of a microwave electric field that is efficiently introduced and a magnetic field produced by a solenoid coil.