The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 1998
Filed:
May. 07, 1997
Applicant:
Inventor:
Norio Semba, Kumamoto, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03D / ; B08B / ;
U.S. Cl.
CPC ...
396611 ; 396627 ; 134902 ;
Abstract
The present invention provides a method for developing treatment, in which a developing solution is supplied to an object to be treated for performing a developing treatment, comprising the steps of supplying pure water onto a surface of said treating object for forming a pure water film on the surface of the treating object, and supplying a developing solution onto the surface of the treating object having the pure water film formed thereon in the preceding step. The particular method of the present invention permits markedly suppressing a defective development.