The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 1998
Filed:
May. 27, 1997
Applicant:
Inventors:
Yi-Chung Sheng, Hsinchu, TW;
Cheng-Hui Chung, Hsinchu Hsien, TW;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438275 ; 438277 ; 438279 ; 438276 ;
Abstract
A self-aligned silicide process for the formation of a mask ROM includes forming a self-aligned silicide layer over the bit lines and the word lines to lower the resistance of the bit lines and word lines in the mask ROM.