The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 1998
Filed:
Apr. 10, 1996
Applicant:
Inventors:
Mitsunori Tsujino, Tokyo, JP;
Mikihiro Kimura, Tokyo, JP;
Assignee:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ; H01L / ; H01L / ;
U.S. Cl.
CPC ...
257316 ; 257369 ;
Abstract
It is an object to obtain evaluation results with a dielectric film evaluating test structure which are close to those with an actual device. Gate electrodes (6A) are provided in a dielectric film evaluating test structure. In the gate electrodes 6A, openings (20) are formed on a gate insulator film (5) by etching, or the like.
Quick Actions:
Tsujino, Mitsunori. (1998). Test structure for dielectric film evaluation (U.S. Patent No. 5841164). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5841164
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile