The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 1998
Filed:
Nov. 21, 1996
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
Proposed is a frame-supported pellicle used for dustproof protection of a photomask in the photolithographic patterning work for the manufacture of electronic fine devices such as LSIs, VLSIs and the like by mounting thereon. The inventive frame-supported pellicle is characterized in that the pellicle frame, to which a pellicle membrane is adhesively bonded on one of the end surfaces, is partly subjected to smoothing treatment. The inventive frame-supported pellicle can solve the heretofore unavoidable problems of dust particle deposition on the photomask even under dustproof protection with a pellicle as well as the high cost of the preparation of the pellicle and the difficulty of finding of any dust particles deposited on the surface of the frame.