The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 1998

Filed:

Aug. 31, 1995
Applicant:
Inventors:

Hsing-Huang Tseng, Austin, TX (US);

Philip J Tobin, Austin, TX (US);

Bikas Maiti, Austin, TX (US);

Assignee:

Motorola Inc., Schaumburg, IL (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438592 ; 438476 ; 148D / ; 148D / ;
Abstract

A process for reducing halogen concentration in a material layer (56) includes the deposition of a dielectric layer (58) overlying the material layer (56). An annealing process is carried out to diffuse halogen atoms from the material layer (56) into the overlying dielectric layer (58). Once the diffusion process is complete, the dielectric layer (58) is removed.


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