The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 1998

Filed:

Nov. 29, 1996
Applicant:
Inventors:

Naoto Tate, Camas, WA (US);

Eva Brown, Vancouver, WA (US);

Michito Sato, Camas, WA (US);

Assignee:

SEH America, Inc., Vancouver, WA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
356239 ; 356237 ;
Abstract

A method of measuring and monitoring the back side and interior defect density of a wafer from its back side by substantially increasing the back side reflectivity through lapping, etching and controlled back side damage, then measuring defect density with an optical scanner.


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