The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 1997
Filed:
Jul. 15, 1996
Ying-Hsiang Chen, Hsin-chu, TW;
Wei-Yao Chien, Nan Tou, TW;
Deh-Hsiung Peng, Hsin-Chu, TW;
Yung-Mao Hsu, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company Ltd., Hsin-chu, TW;
Abstract
An apparatus for venting hazardous effluents from process equipment used in the manufacture of semiconductors, which is part of a larger ventilating system, is a 'see-thru' transparent chamber which performs the function of a hood, and can be mounted on any one of the conventional semiconductor processing equipment. Because it is transparent, the operator can easily determine when to clean the hood. This is important from the point of view of not exposing the work piece in the processing equipment to effluent contaminants. Usually, the effluents are hazardous to health. Hence, the apparatus is equipped with a pair of gloves which are an integral part of an access door to the hood, and is used to manipulate remotely cleaning tools that are kept inside said hood: remote in the sense that the operator is never exposed to the hazardous effluents inside the chamber hood, and yet is easily capable of using the cleaning tools inside the hood by means of the pair gloves that are an integral part of the hood. The throughput of the manufacturing line is favorably affected since cleaning can be accomplished without stopping the process taking place in the semiconductor manufacturing line.