The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 1997
Filed:
Jan. 22, 1996
Applicant:
Inventors:
John Chen, Beverly, MA (US);
Victor Benveniste, Gloucester, MA (US);
Thomas N Horsky, Boxborough, MA (US);
William E Reynolds, Topsfield, MA (US);
Assignee:
Other;
Primary Examiner:
Int. Cl.
CPC ...
H01J / ; H01S / ;
U.S. Cl.
CPC ...
250251 ; 25049221 ;
Abstract
Method and apparatus for maintaining an ion beam along a beam path from an ion source to an ion implantation station where workpieces are treated with the ion beam. A beam neutralizer is positioned upstream from the beam implantation station and injects neutralizing electrons into the ion beam. A magnetic field is created upstream from the position of the beam neutralizer for inhibiting upstream movement of neutralizing electrons. A disclosed technique for setting up the magnetic field for inhibiting electron movement is with spaced apart first and second permanent magnets.