The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 1997
Filed:
Jun. 05, 1995
Michael Rosenstein, Sunnyvale, CA (US);
Howard Grunes, Santa Cruz, CA (US);
Stephen Bruce Brodsky, Fishkill, NY (US);
Applied Materials, Inc., Santa Clara, CA (US);
International Business Machines Corporation, Amonk, NY (US);
Abstract
A structure and method is described for securing an overspray shield in processing chambers in the wall sandwich of the chamber or using a dimensionally compliant floating spacer ring to elastically clamp the overspray shield in position in a vacuum substrate processing chamber without the use of removable fasteners. The configuration uses the differential pressures between the inside and outside of the chamber to clamp the overspray shield along with its shield clamping assembly components at a spacer position in the chamber. The spacer position is generally interior to vacuum sealing limits of the chamber. The arrangement is such that if misalignment occurs a good vacuum-type seal cannot be achieved unless the parts are moved to correct alignment. When correctly aligned the overspray shield is tightly held to the processing chamber wall and electrical continuity between the processing chamber wall and the overspray shield is assured throughout expected process conditions.