The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 04, 1997

Filed:

Jun. 13, 1996
Applicant:
Inventors:

Rustom F Irani, Santa Clara, CA (US);

Reza Kazerounian, Alameda, CA (US);

Mark Michael Nelson, Pocatello, ID (US);

Assignees:

Waferscale Integration Inc., Fremont, CA (US);

American Microsystems, Inc., Pocatello, ID (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437 45 ; 437 48 ; 148D / ;
Abstract

A method of manufacturing a ROM array to minimize band-to-band tunneling is described. The method includes the steps of: a) implanting bit lines into the core area of a substrate as per a later-removed bit line mask, b) providing a ROM oxide layer over the entirety of the substrate, c) etching the ROM oxide layer only from the periphery area as per a later-removed core protect mask, d) providing a gate oxide layer over the entirety of the ROM array, e) laying down polysilicon rows in the core area as per a polysilicon mask and f) implanting a ROM implant into selected areas of the core area, thereby to produce turned off core transistors. The thickness of the gate oxide layer and the ROM oxide layer are independent of each other.


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