The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 1997
Filed:
May. 16, 1996
William T Chou, Cupertino, CA (US);
Solomon I Beilin, San Carlos, CA (US);
David Kudzuma, San Jose, CA (US);
Wen-chou Vincent Wang, Cupertino, CA (US);
Fujitsu Limited, , JP;
Abstract
Methods for pretreating patterned masks layers, such as photoresist masks, with electron-beam radiation for use in high temperature processes are disclosed. The electron-beam exposure deactivates compounds within the mask material which would ordinarily decompose and produce gasses within the photoresist layer. The gasses cause blistering in the untreated photoresist layer, which in turn degrades the dimensional integrity of the untreated layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile