The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 1997
Filed:
Apr. 28, 1995
Candace J Freedenberg, Poughkeepsie, NY (US);
David C Long, Wappingers Falls, NY (US);
Joshua M Cobb, Millbrook, NY (US);
Mark J LaPlante, Walden, NY (US);
Uldis A Ziemins, Poughkeepsie, NY (US);
Daniel G Patterson, Wappingers Falls, NY (US);
James G Balz, Maybrook, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A desired design for electronic structures is converted into a graphic design format and sorted into a pseudo-raster format corresponding to scan lines. A laser or other machining beam is controlled by a separate tracking beam utilizing a mid-objective scanning system. The firing frequency of the machining beam is determined by the position of the tracking beam on a detector, as compared to the scan line data. Accuracy is verified by detection of plume or spectra generated during machining. Alignment of the machining and tracking beams is by interferometric methods. The system improves optical performance parameters of telecentricity, angle of scanned beam line, location of line in which the scanned line resides, astigmatism and field curvature.