The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 1996
Filed:
Jun. 30, 1994
Michael J Balconi-Lamica, Poughquag, NY (US);
Steven G Barbee, Dover Plains, NY (US);
Tony F Heinz, Chappaqua, NY (US);
Yiping Hsiao, San Jose, CA (US);
Leping Li, Poughkeepsie, NY (US);
Eugene H Ratzlaff, Hopewell Junction, NY (US);
Justin Wai-chow Wong, Burlington, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A contactless method and apparatus for real-time in-situ monitoring of a chemical etching process for the etching of at least one wafer in a wet chemical etchant bath are disclosed. The method comprises the steps of providing at least two conductive electrodes in the wet chemical bath, wherein the at least two electrodes are proximate to but not in contact with the at least one wafer, and further wherein said two electrodes are positioned on the same side of the wafer; and monitoring an electrical characteristic between the at least two electrodes, wherein a prescribed change in the electrical characteristic is indicative of a prescribed condition of the etching process. Such a method and apparatus are particularly useful in a wet chemical etch station.