The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 1995
Filed:
Dec. 23, 1992
Applicant:
Inventors:
Richard L Hansen, St. Louis, MO (US);
Mohsen Banan, St. Louis, MO (US);
Assignee:
MEMC Electronic Materials, Inc., St. Peters, MO (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
134-1 ; 134-2 ; 134 21 ; 134-11 ;
Abstract
A process for cleaning organic contaminants from the surface of polycrystalline silicon. In the process, the surface of the polycrystalline silicon is exposed to an oxidizing medium which directly oxidizes the organic contaminant. The oxidized contaminants are then carried away from the polycrystalline silicon surface.
Hansen, Richard. (1995). Cleaning of polycrystalline silicon for charging into a czochralski (U.S. Patent No. 5445679). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5445679
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile