The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 1995
Filed:
Nov. 19, 1993
Applicant:
Inventors:
Towl Ikeda, Yamanashi, JP;
Teruo Iwata, Nirasaki, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ;
U.S. Cl.
CPC ...
118 50 ; 118715 ; 118719 ; 20429833 ;
Abstract
A vacuum processing apparatus comprises a vacuum processing chamber for subjecting an object to be processed to a predetermined vacuum processing, an auxiliary vacuum chamber whose internal pressure is variable repeatedly between an atmospheric pressure and a process pressure, when the object is put in and taken out of the vacuum processing chamber, and exhaust system for exhausting a gas from the auxiliary vacuum chamber. The exhaust system has at least one exhaust port located apart from an internal wall surface of the auxiliary vacuum chamber.