The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 1995
Filed:
Oct. 28, 1994
Francisco A Leon, Mountain View, CA (US);
Donald L Scharfetter, Los Altos Hills, CA (US);
Gregory Anderson, Stanford, CA (US);
Satoshi Tazawa, Atsugi, JP;
Akira Yoshii, Isehara, JP;
Nippon Telegraph and Telephone Corporation, Tokyo, JP;
Intel Corporation, Santa Clara, CA (US);
Abstract
A topography simulator using a 'Generalized Solid Modeling (GSM) method' to simulate isotropic or anisotropic deposition and etch process steps on a workpiece. A solids modeling system that utilizes a boundary representation model for representing material object solids provides a basis for the topography simulator. A workpiece in the model is comprised of a collection of material solids. The present invention provides for accurately representing the interfaces of different material solids. The airspace above the top surface material is defined as an air solid. Boolean set operations between the various material solids and the air solid are performed to deform the wafer topography. The present invention further provides means for simulating an etch process step at the interface of materials with different etch rates.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile