The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 1995
Filed:
Aug. 13, 1993
Applicant:
Inventors:
Roger Patrick, Santa Clara, CA (US);
Frank Bose, Wettingen, CH;
Assignee:
LSI Logic Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H / ;
U.S. Cl.
CPC ...
156627 ; 156626 ; 156345 ; 20429832 ; 20419233 ;
Abstract
The present invention relates to a system and method for detecting the end-point of a layer being removed from a semiconductor wafer by a plasma etching system. The invention determines end-point by referencing first and second positions of matching components of a matching network between a radio frequency source and the plasma etching system chamber. Comparison of a first position representative of chamber load impedance before end-point, and a second position representative of a change in chamber load impedance is utilized to determine end point.