The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 1994
Filed:
Dec. 14, 1993
Kiichiro Otsuka, Tokyo, JP;
Mitsuyasu Iwanaga, Tokyo, JP;
Jeol Ltd., Tokyo, JP;
Abstract
An analytical instrument using a plasma is disclosed. The instrument includes two plasma torches, a first torch of which is used for vaporizing a sample and a second plasma torch is used for exciting the sample. When the analytical instrument is a mass spectrometer, the sample vaporized by the first plasma torch is introduced into the second plasma torch where the sample is ionized. The sample is then mass analyzed. If the sample is a small solid sample, it is momentarily vaporized by the plasma flame generated from the first plasma torch. If the sample is a large solid sample, it can be gradually vaporized from its surface. Therefore, the sample can be analyzed without requiring any pretreatment, e.g., dissolving the sample in an acid.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile