The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 1994
Filed:
Nov. 13, 1992
Tokyo Electron Limited, Tokyo, JP;
Abstract
A magnetron sputtering apparatus which includes a vacuum chamber, a plurality of sputtering guns, arranged in the vacuum chamber, for emitting sputter particles, a support member for supporting an object to be processed, on which a thin film is to be formed within the vacuum chamber, and a movement mechanism for moving the sputtering guns and the support member relative to each other, wherein sputter particles sputtered from the target by the plasma produced in the recess are deposited on the object to be processed. Each sputtering gun includes a target having a recess, a sputtering gas supplying pass for supplying a sputtering gas into the recess, an electric field producing mechanism for producing an electric field in the recess, thereby generating a plasma of the sputtering gas, and a magnetic field producing mechanism for production, in the recess, of a magnetic field including a component which crosses the electric field at right angles.