The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 1994
Filed:
Jun. 07, 1991
Toshihiko Tanaka, Tokyo, JP;
Norio Hasegawa, Tokyo, JP;
Toshiaki Yamanaka, Iruma, JP;
Akira Imai, Kokubunji, JP;
Hiroshi Shiraishi, Hachiohji, JP;
Takumi Ueno, Hachiohji, JP;
Hiroshi Fukuda, Kokubunji, JP;
Hitichi, Ltd., Tokyo, JP;
Abstract
A comb-like or dot-like phase shifter pattern is added to a phase shifter used in phase shifting mask technology, which is then exposed onto a wafer. This enables the formation of extremely fine line patterns or space patterns having widths different from each other simultaneously. Further, when two reticles are disposed such that phase shifter patterns disposed therein intersect each other and are exposed consecutively onto a wafer, a fine hole pattern or dot pattern can be formed at a position where the phase shifter patterns intersect each other.