The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 1994
Filed:
Jul. 24, 1992
Applicant:
Inventors:
Kazuhiko Sugiyama, Nirasaki, JP;
Masafumi Shimizu, Yamanashi, JP;
Yukio Naito, Kofu, JP;
Eiichi Nishimura, Yamanashi, JP;
Kouichi Oshima, Yamanashi, JP;
Assignee:
Tokyo Electron Yamanashi Limited, Nirasaki, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; C23F / ;
U.S. Cl.
CPC ...
20429832 ; 20419233 ; 156345 ;
Abstract
A plasma processing apparatus has a process chamber and a pair of electrodes provided in the process chamber to oppose each other. An RF power supply outputs an RF power to be supplied to at least one of the pair of electrodes in the process chamber. A power detector detects an actual RF power to be applied to one of the electrodes in the process chamber. A controller controls the RF power output from the RF power supply to a predetermined value in accordance with the actual RF power detected by the power detector.