The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 1993
Filed:
May. 28, 1992
Yuichi Wada, Kofu, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A magnetron sputtering apparatus having a heating susceptor in a vacuum chamber to support a wafer. The wafer is fixed on a ring-shaped projection by clamps at wafer-mounted section on the top of the susceptor. A substantially closed space is formed between the underside of the wafer and that face on the top of the susceptor which is defined by the wafer-mounted section to oppose the underside of the wafer. Ar gas which serves as heat-medium gas is supplied into the closed space, flowing into it from its peripheral area. The Ar gas is exhausted at the center of the closed space by a vacuum pump. Heat is transmitted from the susceptor of the wafer through the Ar gas to set the wafer at a certain temperature.