The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 12, 1993

Filed:

Dec. 31, 1990
Applicant:
Inventor:

Masami Nishio, Kagawa, JP;

Assignee:

Futec Inc., Takamatsu, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K / ;
U.S. Cl.
CPC ...
382 22 ; 382-8 ; 382 48 ; 358101 ; 358106 ; 358107 ;
Abstract

A method for matching patterns includes the steps of optically scanning a master image and a to-be-recognized image and outputting master image data and to-be-recognized image data, extracting master outline data representing an outline of the master image from the master image data, extracting to-be-recognized outline data representing an outline of a to-be-recognized image from the to-be-recognized image data, performing an enlargement process for the to-be-recognized outline data to enlarge the to-be-recognized outline, thereby forming to-be-recognized outline data, and collating the master outline data with the to-be-recognized outline data, and if a portion of the master outline projects from the to-be-recognized outline, determining that the to-be-recognized image has a short-defect indicating an omission of the image


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