The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 1993
Filed:
Oct. 10, 1989
Applicant:
Inventors:
Tsuneo Terasawa, Hachioji, JP;
Norio Hasegawa, Tokyo, JP;
Toshihiko Tanaka, Tokyo, JP;
Hiroshi Fukuda, Kokubunji, JP;
Toshiei Kurosaki, Katsuta, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N / ; G01N / ;
U.S. Cl.
CPC ...
356237 ; 356394 ; 356239 ; 356353 ; 250572 ;
Abstract
A method of and an apparatus for detecting a defect on a phase-shifting mask for use in a projection aligner in which either or both of respective intensities of transmitted and reflected light beams from the mask illuminated with light are used for detecting a defect on the mask.
Terasawa, Tsuneo. (1993). Method of and apparatus for detecting defect on photomask (U.S. Patent No. 5235400). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5235400
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile