The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 20, 1993

Filed:

Nov. 29, 1991
Applicant:
Inventors:

Isahiro Hasegawa, Zushi, JP;

Takashi Yokota, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ;
U.S. Cl.
CPC ...
156345 ; 156643 ; 118723 ; 20429837 ;
Abstract

A plasma processing apparatus includes a plasma processing section and a control section for controlling an operation of a driving system of the processing section. The control section includes a CPU, arranged to be separated from the plasma processing section, for outputting a digital control signal to the driving system of the plasma processing section, a first converter, arranged on the CPU side, for converting a parallel signal from the CPU into a serial signal, a second converter, arranged on the processing section side, for converting the serial signal from the first converter into a parallel signal and outputting the parallel signal to the processing section, a cable for transmitting a serial signal between the first converter and the second converter, and a timing control circuit for controlling timings of transmission/reception signals of the first and second converters.


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