The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 23, 1993

Filed:

Mar. 24, 1992
Applicant:
Inventors:

I-Chia H Chang, Peekskill, NY (US);

Wilma J Horkans, Ossining, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
2041531 ; 204413 ; 204405 ; 204434 ;
Abstract

A method for measuring concentrations of addition agents in solutions of additive mixtures, namely for monitoring additives in PbSn plating solutions, comprising the steps of: (a) preparing a basis solution which contains an electroactive species whose electroreduction reaction is sensitive to the additive of interest; (b) preparing calibration standard sample solutions comprising appropriate concentrations of all species other than the additive; (c) preparing the working solution whose additive concentration is to be determined; (d) applying a pulse voltammetry technique, at a hanging Hg drop electrode, to a sample of the basis solution located in a cell of a polarographic analyzer; (e) thereafter measuring the polarographic peak height for the indicator reaction in the basis solution; (f) adding a measured amount of the working solution to the basis solution sample in the cell; (g) thereafter measuring the peak height for the indicator reaction in the mixed solution of step (f); and (h) repeating steps (f) and (g) until the peak height has dropped to a constant value.


Find Patent Forward Citations

Chang, I-Chia. (1993). Method for analyzing the addition agents in solutions for electroplating (U.S. Patent No. 5196096). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5196096

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