The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 1993
Filed:
Aug. 07, 1990
Hiroshi Kurosawa, Atsugi, JP;
Koji Uda, Yokohama, JP;
Kunitaka Ozawa, Isehara, JP;
Shunichi Uzawa, Tokyo, JP;
Nobutoshi Mizusawa, Yamato, JP;
Shigeyuki Suda, Yokohama, JP;
Noriyuki Nose, Tokyo, JP;
Takao Kariya, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus for printing a pattern of a mask to a wafer includes a mask moving mechanism for moving the mask; a wafer moving mechanism or moving the wafer along a predetermined movement coordinate; a measuring system for measuring an error with respect to the movement coordinate, resulting from the movement of the mask by the mask moving mechanism; and a memorizing device for memorizing a data table prepared on the basis of the error measured by the measuring system; wherein the wafer moving mechanism uses the data in the data table when it moves the wafer for positioning of the wafer with respect to the mask.