The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 1992
Filed:
Oct. 16, 1990
Jenoe Tihanyi, Munich, DE;
Christine Fellinger, Unterhaching, DE;
Siemens Aktiengesellschaft, Berlin and Munich, DE;
Abstract
A bipolar transistor is disclosed including a semiconductor body having a cathode-side surface and an anode-side surface, and at least one insulated gate electrode. The semiconductor body has a central region with a predetermined doping concentration and of a first conductivity type. The central region borders on the cathode-side surface of the semiconductor body. Bordering on the cathode-side surface, at least one gate region is provided which borders on the central region. The gate region is of the second conductivity type and has a higher doping concentration than the central region. In the gate region, a source region is provided which borders on the cathode-side surface. The gate electrode is seated on an insulating layer applied on the cathode-side surface and covers the gate region. Between the anode-side surface and the central region is provided an anode region of the second conductivity type which has a higher doping concentration than the central region. Between gate region and source region, a shunt is provided. The anode region is a recrystallized region of a metal silicon alloy doped with a doping substance.