The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 1992
Filed:
Jun. 18, 1991
Applicant:
Inventors:
Naoto Sano, Kunitachi, JP;
Masato Aketagawa, Yokohama, JP;
Hitoshi Nakano, Kawasaki, JP;
Takahisa Shiozawa, Yokohama, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ; G03B / ; G03B / ;
U.S. Cl.
CPC ...
355 53 ; 355 71 ; 355 77 ;
Abstract
An exposure method, includes the steps of directing a radiation beam to a substrate to be exposed; and substantially correcting any change in the size of the radiation beam. Also, there is disclosed an exposure apparatus, which includes a laser for emitting a laser beam; a detector for detecting any change in the size of the laser beam; and a device for directing the laser beam to a substrate to be exposed, the directing device including a compensator responsive to an output signal from the detector for substantially correcting the change in the beam size.