The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 1992
Filed:
Dec. 05, 1989
Applicant:
Inventors:
Takeshi Hioki, Tondabayashi, JP;
Koji Kuwana, Osaka, JP;
Jun Tomioka, Hyogo, JP;
Hirotoshi Nakanishi, Osaka, JP;
Yasunori Uetani, Osaka, JP;
Yukio Hanamoto, Osaka, JP;
Fumio Oi, Hyogo, JP;
Assignee:
Sumitomo Chemical Company, Limited, Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430168 ; 430192 ; 430193 ; 430169 ; 528482 ; 528499 ; 528501 ;
Abstract
A process for preparing a positive resist composition, which process includes the steps of condensation reacting a quinone diazide sulfonyl halogenide with a phenol compound, mixing a condensation reaction mixture with a solution of an alkali-soluble resin in a resist solvent and removing impurities from the mixture, whereby the overall processing time can be shortened.