The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 08, 1991

Filed:

Mar. 16, 1990
Applicant:
Inventors:

Bunsen Fan, Peekskill, NY (US);

Donis G Flagello, Ridgefield, CT (US);

Jeffrey D Gelorme, Plainville, CT (US);

Modest M Oprysko, Mahopac, NY (US);

Albert Speth, Yokners, NY (US);

Jeannine M Trewhella, Peekskill, NY (US);

Assignee:

IBM Corporation, Yorktown Heights, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B / ;
U.S. Cl.
CPC ...
385130 ; 430 97 ; 385143 ; 385145 ;
Abstract

A structure comprising a layer of polymeric material containing epoxy groups having preselected regions of different degrees of polymerization and different refractive indices; and a method for forming a structure comprising a layer of polymeric material containing epoxy groups having preselected regions of differing degrees of polymerization and differing refractive indices which comprises providing a polymeric material containing epoxy groups on a support and selectively modifying the refractive index in said material.


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