The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 1991
Filed:
Aug. 20, 1990
Kiyoshi Hattori, Tokyo, JP;
Shuichi Tamamushi, Kawasaki, JP;
Eiji Nishimura, Kawasaki, JP;
Naotaka Ikeda, Fujisawa, JP;
Hirotsugu Wada, Tokyo, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
A method of correcting astigmatism of a variable shaped beam uses a charged beam lithographic apparatus having a deflector for generating the shaped beam, a focus correction coil for adjusting a focus of the shaped beam, and astigmatism correction coils for correcting the astigmatism of the shaped beam. The method comprises the steps of adjusting the focus of the shaped beam by using the focus correction coil, and correcting the astigmatism of the shaped beam by using the astigmatism correction coils, the step of correcting the astigmatism of the shaped beam including the substeps of measuring first edge resolutions of the shaped beam in an arbitrary first direction and a second direction perpendicular to the first direction, and correcting first astigmatism in the first and second directions on the basis of the first edge resolutions, and measuring second edge resolutions in a third direction oblique to the first direction and a fourth direction perpendicular to the third direction, and correcting second astigmatism in the third and fourth directions on the basis of the second edge resolutions.