The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 1990
Filed:
Jan. 24, 1990
Applicant:
Inventors:
Masahiko Okunuki, Tokyo, JP;
Mitsuaki Seki, Machida, JP;
Isamu Shimoda, Zama, JP;
Mamoru Miyawaki, Tokyo, JP;
Takeo Tsukamoto, Atsugi, JP;
Akira Suzuki, Yokohama, JP;
Tetsuya Kaneko, Yokohama, JP;
Toshihiko Takeda, Tokyo, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K / ;
U.S. Cl.
CPC ...
21912112 ; 2191213 ; 21912126 ; 21912128 ; 2504923 ; 2504922 ; 2504911 ;
Abstract
A multi-electron-beam pattern drawing apparatus having a plurality of electron beam sources and a plurality of electron beam sensors, provided on a common base member, is disclosed. The electron beam sources can be selectively driven for different uses, such as a pattern drawing (exposure) purpose and position detecting purpose, for example. In another aspect, the apparatus is provided with a function for correcting the pattern drawing magnification.