The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 1990
Filed:
Mar. 14, 1990
Applicant:
Inventors:
Gary B Powell, Petaluma, CA (US);
David J Drage, Sebastopol, CA (US);
Tony Sie, Walnut Creek, CA (US);
Assignee:
Matrix Integrated Systems, Richmond, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; H01L / ; C23F / ; C03C / ;
U.S. Cl.
CPC ...
156626 ; 156643 ; 156345 ; 156646 ; 20419233 ; 20429832 ;
Abstract
A parallel plate plasma type etching apparatus is provided with a temperature control chuck 44 so that elevated substrate temperatures are controlled. With an elevated substrate temperature, the reaction rate is increased. With positive temperature control, the likelihood of damage to the semiconductor devices is significantly reduced. The chuck is provided with a large number of equally spaced electrical heaters 72 and control of the heaters is by a temperature sensor 74.