The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 1990
Filed:
Jun. 06, 1989
Hitachi, Ltd., Tokyo, JP;
Abstract
Disclosed is a plasma ion source mass spectrometer comprising an ion source in which a sample to be detected is ionized in plasma and a mass spectrometer which mass-separates and detects the ionized sample supplied from the ion source, characterized in that there is provided a gas introduction means for introducing into a region before the mass spectrometer a gas containing particles which can bring about a charge transfer reaction with background ions contained in particles supplied from the ion source or a gas containing particles which can bring about an energy transfer reaction with excited molecule contained in the particles supplied from the ion source. By providing such gas introduction means, background ions or excited molecule can be efficiently quenched and enhancement of sensitivity of plasma ion source mass spectrometer can be attained.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile