The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 1990
Filed:
Apr. 24, 1989
Robert C Bausmith, Glastonbury, CT (US);
William J Cote, Essex Junction, VT (US);
John E Cronin, Milton, VT (US);
Karey L Holland, Essex, VT (US);
Carter W Kaanta, Colchester, VT (US);
Pei-Ing P Lee, Williston, VT (US);
Terrance M Wright, Williston, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for dry etching metals that form low volatility chlordes, in which Z-Cl reaction products are controllably introduced into a conventional Cl-based plasma independent of the workpiece. The Z-Cl products (e.g., AlCl.sub.3, GaCl.sub.3, etc.) are metal chlorides that have both electron acceptor and chloride donor properties. Thus, metals M (e.g., cobalt, copper and nickel) that usually produce low volatility chlorides can be controllably complexed to form high volatility Z.sub.x Cl.sub.y M.sub.z reaction products.