The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 1990
Filed:
Aug. 26, 1988
Mamoru Sugita, Kumamoto, JP;
Tokyo Electron Limited, Tokyo, JP;
Tel Kyushu Limited, Kumamoto, JP;
Abstract
In an exposure method of the present invention, exposure light is radiated onto a peripheral portion of a substrate to be processed while the substrate is rotated, and the rotational speed of the substrate is selectively decreased when a specific peripheral portion reaches an exposure area, thereby performing predetermined exposure of the substrate. An exposure apparatus of the present invention includes a mounting table on which the substrate is mounted, a rotating mechanism for rotating the mounting table at a predetermined rotational speed, a light radiating element arranged to oppose a mounting surface of the mounting table, light amount control means for controlling the amount of light radiated from the light radiating element onto the substrate, and rotational speed control means for controlling the rotational speed of the mounting table in accordance with the radiation amount of light from the light radiating element.