The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 1989
Filed:
Jul. 26, 1988
Akira Fukunaga, Kanagawa, JP;
Yoichi Mori, Kanagawa, JP;
Ebara Corporation, Tokyo, JP;
Ebara Research Co., Ltd., Kanagawa, JP;
Abstract
A method of treating a waste gas containing at least boron trichloride and chlorine comprises first treating the waste gas with a treating agent containing a magnesium compound by a dry process and then treating the waste gas with a treating agent containing a calcium compound by a dry process. Thus, it is possible to remove efficiently a chloride and chlorine containing gas from waste gas discharged from a dry etching process or other manufacturing process in the semiconductor industry. In addition, it is possible to reduce the amount of treating agent used, lengthen the treating agent replacing cycle, and facilitate the maintenance of the system.