The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 01, 1989

Filed:

Jul. 28, 1986
Applicant:
Inventors:

Tadayoshi Shiraishi, Takasago, JP;

Naohiro Imai, Kakogawa, JP;

Takeshi Domoto, Kakogawa, JP;

Keiji Kameyama, Kakogawa, JP;

Ikuo Katsumi, Kobe, JP;

Takayoshi Hidaka, Kobe, JP;

Kazunori Hosoe, Takasago, JP;

Kiyoshi Watanabe, Akashi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61K / ; A61K / ; A61K / ; A61K / ; A61K / ; A61K / ; A61K / ; A61K / ; A61K / ; A61K / ; A61K / ; C07D / ; C07D / ; C07D / ; C07C / ; C07C / ; C07C / ; C07C / ; C07C / ;
U.S. Cl.
CPC ...
514404 ; 514424 ; 514473 ; 514570 ; 514618 ; 514713 ; 548321 ; 548361 ; 548543 ; 549323 ; 558401 ; 560-9 ; 560 11 ; 560 12 ; 560 13 ; 562426 ; 562429 ; 562430 ; 564162 ;
Abstract

A 3-phenylthiomethylstyrene derivative having the general formula (1): ##STR1## or salt thereof with a base, when X is hydroxyl group, R.sup.1 is hydrogen atom or R.sup.2 is hydrogen atom, a process for preparing the 3-phenylthiomethylstyrene derivative (1), and an antiallergic agent and a tyrosinekinase inhibiting agent containing the 3-phenylthiomethylstyrene derivative (1) as an effective component. The compound (1) of the present invention is a useful intermediate for preparing various organic compounds, and has excellent antiallergic and tyrosinekinase inhibiting activities.


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