The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 02, 1989

Filed:

Mar. 14, 1988
Applicant:
Inventors:

Vincent J Coates, Palo Alto, CA (US);

Warren W Lin, Fremont, CA (US);

Assignee:

Nanometrics, Incorporated, Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356351 ; 356357 ; 356369 ;
Abstract

A system for the precise measurement of thin dielectric films on a substrate by directing a plane polarized laser light beam to the film at the Brewster angle of the substrate and by measuring the intensity changes between a measurement from the substrate alone and from the film coated substrate. Accurate thin film measurements in the range of from about 10 to 1,500 Angstroms are possible.


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