The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 1988
Filed:
Aug. 07, 1986
Applicant:
Inventors:
Assignee:
Anelva Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; B65G / ;
U.S. Cl.
CPC ...
204298 ; 2041921 ; 118500 ; 118724 ; 198378 ; 198344 ; 1984781 ; 1984741 ; 414225 ;
Abstract
In a substrate processing apparatus, a substrate is processed to form a thin film thereon while it is maintained in the vertical direction, Furthermore, the rear surface of the substrate is cooled by a substrate cooling mechanism which contacts the rear surface thereof. The substrate cooling mechanism moves in a reciprocating fashion, whereas a substrate holder for holding the substrate moves both in horizontal and vertical directions.