The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 1987
Filed:
Apr. 15, 1986
Applicant:
Inventors:
Shoji Shukuri, Koganei, JP;
Masao Tamura, Tokorozawa, JP;
Yasuo Wada, Tokyo, JP;
Yoshihisa Fujisaki, Tokyo, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; G01N / ;
U.S. Cl.
CPC ...
437 27 ; 2504921 ; 2504922 ; 357 91 ; 427 38 ; 437 20 ; 437 22 ; 437987 ; 437930 ;
Abstract
A desired part of a workpiece is irradiated with a focused ion beam which contains at least two species of impurity ions to-be-implanted exhibiting different spacial distributions of ion current densities. Thus, regions respectively implanted with different species of impurity ions can be formed in a predetermined positional relationship at high precision.