The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 1987

Filed:

Aug. 13, 1986
Applicant:
Inventors:

Stanford R Ovshinsky, Bloomfield Hills, MI (US);

David D Allred, Troy, MI (US);

Lee Walter, Bloomfield Hills, MI (US);

Stephen J Hudgens, Southfield, MI (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
427 39 ; 437225 ;
Abstract

An improved method of depositing thin films onto a substrate with microwave energy by operating at substantially the minimum of the pressure-power curve for the particular geometry of reaction vessel and composition of reaction gases being utilized.


Find Patent Forward Citations

Ovshinsky, Stanford. (1987). Method of depositing thin films using microwave energy (U.S. Patent No. 4701343). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4701343

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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