The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 1987
Filed:
Oct. 19, 1984
Applicant:
Inventors:
Michael Hatzakis, Chappaqua, NY (US);
John J Liutkus, Yorktown Heights, NY (US);
Jurij R Paraszcszak, Ossining, NY (US);
Jane M Shaw, Ridgefield, CT (US);
Assignee:
International Business Machines Corp., Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ; C08F / ;
U.S. Cl.
CPC ...
526293 ; 526206 ;
Abstract
Poly(halogenated styrene) compositions having a molecular weight range of from about 1.times.10.sup.5 to 1.times.10.sup.6 and a dispersivity of from about 1.5 to about 2.5 useful as negative resists.
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Hatzakis, Michael. (1987). Halogenated polystyrenes for electron beam, x-ray and photo resists (U.S. Patent No. 4678850). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4678850
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile